Palladium nanoshell tube (wall thickness about 20 nm) produced by wetting a porous alumina template

M. Steinhart, U. Gösele et al., Adv. Mat. 15, 706 (2003)

Forschung » Nanostrukturierte Template

Nanostrukturierte Template


For the controlled deposition or removal of materials at predefined locations on a nanometer scale nanostructured templates or masks play a crucial role. Well-known examples of masks are those used in microelectronic chip processing involving typical top-down approaches such as photo- and electron beam lithography (EBL).
Similarly, focused ion beam (FIB) techniques may be used to structure masks or materials directly. A top-down technique presently under development and a potential major competitor to conventional lithography is nanoimprint lithography (NIL). The most advanced EBL, FIB, and NIL equipment combined with deposition and etching systems will be available for use within the planned CoE, partly in close collaboration with the companies developing the equipment, at the nanofabrication facility of technology incubator (TGZ III) which is presently under construction.
Even though many areas of nanoscience and -technology have greatly benefited from the availability of top-down lithographic techniques, in many cases major advances involved nanostructures fabricated based on self-organized processes. Nanostructures based on these bottom-up approaches may often be tailored down to the atomic or molecular level and may cost only a small fraction of those based on typical lithographical approaches. Presently, these self-organized structures have not yet shown the sophistication and complexity which can be attained by repeated application of lithographic techniques, but biological structures obviously exemplify that bottom-up approaches clearly have the ability to lead to highly complex structures.

(letzte Änderung: 07.12.2011, 07:59 Uhr)